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good quality, which makes it suitable for cutting small openings on a wide range of high-density flexible circuits. Unfortunately, the productivity rate becomes extremely slow when cutting larger openings. Actually, it becomes impractical from a cost standpoint to utilize a UV:YAG laser system for openings larger than 10,000 mm2. Carbon dioxide TEA lasers, as well as diamond carbon dioxide lasers, have a much higher productivity rate when producing openings wider than 70 mm. The definition of the opening and quality of the edges, however, is somewhat less desirable than for other laser systems. In order to facilitate surface plating, a suitable cleaning process such as plasma is required to remove the thin residue remaining on the copper surface. A copper mask process helps to improve both quality and speed of the carbon dioxide laser process. The excimer laser process, like the UV:YAG laser system, minimizes the potential for thermal damage on very thin flying leads. The carbon dioxide laser generates a remarkable amount of heat. The beam power density of the laser must be controlled carefully in order to process 18-mm copper with high-density flying leads narrower than 100 mm wide.

Plasma Etching and Chemical Etching Plasma and chemical etching processes are other suitable choices for generating high-density flying-lead structures Although their capabilities are somewhat less than those of laser processing, these processes can provide a lower-cost model of high-volume processing A copper foil mask is required in order to define the exposure area, and specific process conditions are required to remove organic substrates effectively These processes are quite effective for singlesided substrates Double-sided substrates can be processed in this manner given very specific materials and construction A big advantage of these processes is the unlimited number of holes or openings that can be processed simultaneously Performance value is high, while manufacturing costs remain fixed when larger sizes or higher numbers of holes are processed The plasma process is capable of etching all kinds of organic materials; however, it must be performed in a vacuum chamber.

Capital investment is relatively large for high-volume production Another issue involves uniform quality over a large working area/panel size in a vacuum chamber of limited size Depending on the process conditions, plasma etching creates a wall slope of 30 to 60 at the edge of the openings, and it is difficult to make holes smaller than 100 mm in diameter on a 50-mm-thick polyimide layer Chemical etching also offers a low-cost process for creating access openings in high volume on polyimide-based high-density flexible circuits This process offers the capability of generating openings smaller than 100 mm in diameter or slit width on 25-mm substrates, while providing a very small slope on the wall definition of the opening The issue in this process is finding the appropriate chemicals and creating the suitable conditions to etch the various flexible substrates.

1. When preparing for a group presentation, what should the team avoid doing (a) Practicing each other s material (b) Practicing together (c) Expecting individual speakers to prepare their own slides (d) Dressing alike 2. Slides used by the group should: (a) Use a common template (b) Use a consistent tone and message (c) Be about equal in number from speaker to speaker (d) All of the above 3. An investment group chose three construction companies as nalists to bid on the contract to build a shopping center. The investors invited representatives from all three companies to meet at a conference center to present their proposals. You re the project manager for CSL Contractors, a nalist in the bid process. Which is the best way to start your preparation (a) Start practicing your most important points right away. (b) Choose what you will wear. (c) Determine who will be in the audience, and choose your team members. (d) Visit the conference center to determine your main points. 4. Continuing the scenario in question 3, when you arrive at the conference center on the day of your presentation, what should you do (a) Meet the technical support person. (b) Check the room setup. (c) Con rm that everyone is dressed in a similar style. (d) All of the above

Sodium hydroxide and potassium hydroxide are popular chemicals for etching Kapton type polyimide materials Dangerous chemistries and tightly controlled process conditions are required to etch dimensionally stable polyimide substrates such as Upilex Serious consideration must be given to choosing the appropriate circuit design, materials, and manufacturing processes On the other hand, chemical processing such as this requires no specialized capital equipment, and it is extremely suitable for high-volume roll-to-roll manufacturing systems Typical high-density flying leads produced by new processes are shown in Fig 666.

Economical Comparison Each technology has its own cost structure, which is dependent on the conditions. Figure 66.7 shows a comparison from an economic study of the various technologies. This study was conducted on 25-mm-thick polyimide substrate with a 300-mm2 working size. The opening size is assumed to be 0.1 3 mm, with flying leads at a 150-mm pitch processed on 18-mm-thick copper.